CD Tesis
Pengaruh Ukuran Grafit, Kecepatan Putar, Tipe Pengaduk Dan Lama Waktu Pada Kombinasi Proses Turbulensi Dan High Shear Exfoliation (Tase-Hse) Terhadap Karakteristik Graphene
The rapid development of carbon-based two-dimensional nanomaterials has
attracted the attention of researchers who are working on developing new
materials with unique properties, one of which is graphene. As graphene
continues to develop, researchers are persistently exploring various synthesis
methods to produce high-quality graphene (with minimized layers and defects) in
an economical manner, suitable for larger-scale production. Defect-free graphene
with few layers can generally be produced by the liquid-phase mechanical
exfoliation method, utilizing graphite powder as the raw material and certain
solvents and/or surfactants. In this study, graphene was synthesized using a
turbulence assisted shear exfoliation process (TASE method) in a kitchen blender,
followed by a shear exfoliation process in a high shear mixer, also known as the
High shear exfoliation (HSE) method, with a working fluid in the form of water
enriched with anionic surfactant (sodium lauryl sulfate). The study investigated
the effects of differences in the size of graphite raw materials, stirrer speed (rpm),
and HSE processing time. Additionally, the type of stirrer (blender type) used in
the TASE process was also compared.
The results were characterized using fingerprint graphene analysis with
Raman spectroscopy and mapping (Raman imaging), crystal structure (XRD), and
morphology (TEM), particle size distribution (PSA), and functional group
analysis (FT-IR). The results showed that graphene synthesized by the TASE-HSE
method was dominated by 2LG, 3LG, 4LG, and 5LG. The parameters used to
produce high-quality graphene were found in samples with graphite size of 5
microns, rotating speed of the HSE tool at 5000 rpm, stirrer type Kenwood
blender, and HSE processing time of 3 hours.The results of Raman spectroscopy
and Raman imaging analysis showed that graphene produced with few defects
was dominated by 2LG graphene and has zigzag and armchair edges. The results
of TEM, XRD, and PSA analysis proved that TASE-HSE graphene had a lateral
size of 396.49 nm, a crystal diameter of 45.1 nm, and an average particle size
distribution of 4μ. Fourier Transform-Infra Red (FTIR) analysis proved that the
type of defects formed on graphene was not caused by an oxidation process, as
evidenced by the absence of epoxy groups, but by the vacancy defects that occured
during the mechanical exfoliation process.
Key Words: Graphene, High Shear Exfoliation, High Shear Mixer, Turbulence
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